Plasma etching processes in micro- and nanotechnologies. Study guide

In the light of the modern development of nanotechnology and micromechanics, the processes and systems of vacuum-plasma etching, which are widespread use in the production of modern ultrasound integrated circuits, products of microelectromechanical systems and nanosystems. The methods of providing vacuum and technical requirements for these processes are analyzed, the methods of control and diagnosis are given, which make it possible to deeply understand the nature of the processes occurring in order to relevant optimization of technology and equipment.
For students of universities that study the processes of micro and nanoelectronics, as well as graduate students, engineers and scientists dealing with the issues of technology of integrated circuits and micromechanics