Inductive sources of high-density plasma and their technological applications

Over the past decade, ICP sources have found wide industrial use, about which a large amount of new information has appeared. Therefore, there is a need to compile a review, the purpose of which is to systematize the main experimental results of the development and use of ICP sources. The book provides a description of the principles of action, features and advantages of ICP sources and consider numerous options for designs of modern ICP sources. Examples of technological applications of the described sources for applying thin films are also given: in PVD and PECVD processes. And in addition, the formation of plasmochemical etching of three -dimensional structures in various materials and two -dimensional structures in thin films and a significant change in the properties of surfaces of various materials, especially semiconductors associated with such processing, is described.
Thus, this book is a detailed reference guide for designs and the use of ICP sources. The book is designed for students, graduate students, designers of new technological equipment using ICP sources, and technologists working on such equipment. The designers will find in it a review of the ways to achieve high parameters of ICP sources, and the techno will get acquainted with the wide range of their use and the achievements obtained with their help. It will also be useful as a training manual for senior students and graduate students of relevant specializations